Plating apparatus and plating method

ABSTRACT

A method for plating a belt substrate including conveying a belt substrate through a plating tank, contacting an immersed cathode power-supply device and/or an auxiliary cathode power-supply device with the belt substrate conveyed into the interior of the plating tank such that the belt substrate becomes a cathode, and electrically plating a surface of the belt substrate in the interior of the plating tank while the immersed cathode power-supply device and/or the auxiliary cathode power-supply device maintains cathode power-supply to the belt substrate conveyed into the interior portion of the plating tank. The immersed cathode power-supply device and the auxiliary cathode power-supply device are positioned in the interior portion of the plating tank and are electrically connected by a short circuit wiring.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of and claims the benefit ofpriority to U.S. application Ser. No. 12/182,745, filed Jul. 30, 2008,which is a continuation of PCT/JP2007/051275, filed Jan. 26, 2007, whichis based on and claims the benefit of priority to Japanese PatentApplication No. 2006-020922, filed on Jan. 30, 2006. The entire contentsof these applications are incorporated herein by reference.

TECHNICAL FIELD

A plating apparatus and associated method to conduct through-holeplating and via-hole plating so as to achieve uniform plated films andfilling performance when plating the interiors of non-through-holes andthrough-holes are provided.

DESCRIPTION OF RELATED ART

Japanese Laid-Open Patent Application 2000-239892 describes a platingapparatus having a plating tank, an advancing device to advance a beltsubstrate into the plating tank; a bottom turning device formed in theplating tank to turn upward the descending continuous belt; a descendingplating zone to plate the belt substrate descending toward the bottomturning device; a non-plating zone to pass the belt substrate ascendingfrom the bottom turning device without applying plating; and apulling-out device to pull out the belt substrate from the plating tankright after it passes the non-plating zone.

SUMMARY OF THE INVENTION

In one exemplary aspect, an apparatus configured to perform anelectrolytic plating on a plating surface of a belt substrate includes aplating tank, a conveyor device configured to carry a belt substratethrough an interior of the plating tank, an immersed cathodepower-supply section provided within the interior of the plating tank,an auxiliary cathode power-supply section provided within the interiorof the plating tank, and short-circuit wiring configured toshort-circuit the immersed cathode power-supply section to the auxiliarycathode power-supply section.

In another exemplary aspect, a plating method for performingelectrolytic plating on a plating surface of a belt substrate includesthe steps of conveying the belt substrate through a plating tank, makingthe plating surface a cathode by contacting at least one of an immersedcathode power-supply section or an auxiliary cathode power-supplysection with the belt substrate, and short-circuiting the immersedcathode power-supply section to the auxiliary cathode power-supplysection.

BRIEF DESCRIPTION OF THE DRAWINGS

A more complete appreciation of the invention and many of the attendantadvantages thereof will be readily obtained as the same becomes betterunderstood by reference to the following detailed description whenconsidered in connection with the accompanying drawings, wherein:

FIG. 1 is a view illustrating a structure of a conveyor mechanism in aplating tank according to first exemplary aspect of the presentinvention (Example 1).

FIG. 2 is a view illustrating a structure of a conveyor mechanism in aplating tank according to a second exemplary aspect of the presentinvention (Example 2).

FIGS. 3A-C are views illustrating the manufacturing steps of a flexibleprinted wiring board using the plating apparatus according to Example 1.

FIGS. 4A-C are views illustrating the manufacturing steps of a flexibleprinted wiring board using the plating apparatus according to Example 1.

FIG. 5 is a perspective view illustrating the conveyor mechanism in theplating tank of the plating apparatus according to a third exemplaryaspect of the present invention (Example 3).

FIGS. 6A-D are views illustrating the manufacturing steps of a flexibleprinted wiring board using the plating apparatus according to Example 3.

FIGS. 7A-E are views illustrating the manufacturing steps of a flexibleprinted wiring board using the plating apparatus according to a fourthexemplary aspect of the present invention (Example 4).

FIGS. 8A-D are views illustrating the manufacturing steps of a flexibleprinted wiring board according to a seventh exemplary aspect of thepresent invention (Example 7).

FIG. 9 is a chart to show the evaluation results of the Examples and aComparative Example.

DETAILED DESCRIPTION

In the conventional art, since a cathode power-supply roller ispositioned outside the solution, a longer plating tank is required.Also, since the substrate is pulled out of the plating solution,occasionally problems occur, such as the plating speed at the interiorsof via holes or through-holes slowing down, or the plating speeddiffering at each interior of via holes and through-holes.

Therefore, one object of the present invention is to provide a platingapparatus and a plating method, such that when a cathode power-supplysection is arranged in a plating tank, plating seldom is extracted ontothe cathode power-supply section. Another object of the presentinvention is to provide a plating apparatus and a plating method, suchthat if a cathode power-supply section is arranged in a platingsolution, damage to a belt substrate, such as dents caused at thecathode power-supply section, is reduced; and to suggest a platingapparatus and a plating method, such that the filling performance ofplating in the interiors of through-holes and via holes is excellent andthe plating thickness is uniform.

As an example, a cathode power-supply section (an immersed cathodepower-supply section) is arranged in a plating solution; and anauxiliary cathode section is connected by short-circuit wiring to theimmersed cathode power-supply section is further arranged to provideelectricity to a plating surface through the cathode power-supplysection.

According to the present invention, using a cathode power-supply sectionof at least either an immersed cathode power-supply section or anauxiliary cathode power-supply section short-circuited by short-circuitwiring, electricity for a plating surface of a belt substrate isprovided. Therefore, if an insulation tape connecting belt substratestouches either the immersed cathode power-supply section or theauxiliary cathode power-supply section, and the electricity from thepower-supply section with which the insulation tape is in contact isblocked; or, due to a loose belt, if the belt substrate is separatedfrom either the immersed cathode power-supply section or the auxiliarycathode power-supply section, and the electricity from the separatedpower-supply section is blocked, the other immersed cathode power-supplysection or the auxiliary cathode power-supply section remains in contactwith the plating surface of the belt substrate to supply electricity.Therefore, electrical potential among the immersed cathode power-supplysection, the auxiliary cathode power-supply section and the beltsubstrate will not differ. Accordingly, on the surfaces of the immersedcathode power-supply section and the auxiliary cathode power-supplysection, electrolytic plated films are seldom extracted. Thus, the needfor maintenance on the cathode power-supply section arranged in theplating tank (including the auxiliary cathode power-supply section inthe plating solution) may be practically eliminated.

Also, since the cathode power-supply section is arranged in the platingtank, the number of power-supply points outside the plating tank may bereduced. Accordingly, the length of the plating tank may be shortened.In addition, from start to finish of the plating, the number of timesthe substrate is pulled out of the plating tank may be reduced. Thus,the filling performance in the interiors of non-through-holes andthrough-holes is enhanced. From start to finish of the plating, it ispossible to arrange all the power-supply sections in the platingsolution. By arranging such, pulling the belt substrate out of theplating tank is not required until the plating is finished.Consequently, the length of the plating tank is further shortened, thefilling performance of the plating in through-holes andnon-through-holes is improved, and the degree of filling at eachthrough-hole and non-through-hole becomes more uniform.

Either the immersed cathode power-supply section or the auxiliarycathode power-supply section may have a conveyor mechanism to carry thebelt substrate. Also, it is sufficient if at least either the immersedcathode power-supply section or the auxiliary cathode power-supplysection is in contact with the belt substrate, because either theimmersed cathode power-supply section or the auxiliary cathodepower-supply section may provide electricity for the plating surface. Ifthe contact between either one of the cathode sections and the beltsubstrate is degraded, through short-circuit wiring electricalcontinuity is maintained from the immersed cathode power-supply sectionand the auxiliary cathode power-supply section to the plating surface.Thus, at the immersed cathode power-supply section, plating is seldomextracted. As a result, the cathode power-supply section is allowed tobe arranged in the plating solution, thus, the number of times theplating substrate is required to be pulled out of the solution isreduced or eliminated. Consequently, the length of the plating tank maybe shortened, the filling performance in non-through-holes andthrough-holes may be enhanced, and the dispersion of the degree offilling may become smaller.

Example 1

First, referring to FIG. 1, the structure of a plating apparatusaccording to Example 1 of the present invention is described. FIG. 1 isa view illustrating the entire structure of the plating apparatusaccording to Example 1. Plating apparatus 10 conducts plating on a beltsubstrate to be used in flexible printed wiring boards. On one surfaceof belt substrate (30A) pulled out of reel (98A), on which a beltsubstrate 180 millimeters wide and 120 meters long is wound,electrolytic plating is performed, then the substrate is wound back totake-up reel (98B). Plating apparatus 10 has immersed power-supplyauxiliary driver (50A) to convey belt substrate (30A) through platingtank 12 as well as to supply electricity; aired power-supply auxiliarydriver (50B) to convey belt substrate (30A) in the air as well as tosupply electricity; and anodes 14 to supply electricity for the platingsolution. Inside anodes 14, copper balls to replenish a copperingredient for the plating solution are contained. In plating tank 12,two immersed power-supply auxiliary drivers (50A) are arranged tostructure a plating line a total of 20 meters long. Here, immersedpower-supply auxiliary driver (50A) is structured with immersed cathodepower-supply roller (power-supply section) 52 and auxiliary cathodepower-supply roller (power-supply section) 54. Immersed cathodepower-supply roller 52 and auxiliary cathode power-supply roller 54 arepositioned, not facing anodes 14 but facing the non-plating surface ofthe belt substrate. Facing the plating surface of the belt substrate,insulative roller 56 is positioned.

In immersed power-supply auxiliary driver (50A), immersed cathodepower-supply section 52 and auxiliary cathode power-supply section 54are both formed with conductive stainless steel and connected torectifiers (80, 80) that supply electric current through power-supplylines (82, 82) respectively. Rectifiers (80, 80) adjust the voltage to arequired electric current value. Furthermore, between immersed cathodepower-supply section 52 and auxiliary cathode power-supply section 54 inimmersed power-supply auxiliary driver (50A), short-circuit wiring 84 isprovided. Here, in immersed cathode power-supply section 52, auxiliarydrive motor is installed to convey belt substrate (30A) at apredetermined feed rate; and auxiliary cathode power-supply section 54rolls according to the conveyed belt substrate (30A). In Example 1,electricity is supplied for immersed cathode power-supply 52 andauxiliary cathode power-supply section 54 from a unit of rectifier 80,but electricity may be supplied by installing rectifier 80 on eachsection. Also, as for material to form immersed cathode power-supplysection 52, it is not limited to stainless steel, but, for example,conductive material such as copper, brass, or iron may be used.

According to the plating apparatus in Example 1, through at least eitherimmersed cathode power-supply section 52 or auxiliary cathodepower-supply section 54 electrically connected by short-circuit wiring84, electricity may be provided for the plating surface of beltsubstrate (30A). Therefore, if the insulation tape at a seam of the beltsubstrate or the insulation tape laminated on the belt substrate makescontact with either immersed cathode power-supply section 52 orauxiliary cathode power-supply section 54, and power supply is blocked;or if immersed cathode power-supply section 52 is tilted, the beltsubstrate is stretched differently at its top and bottom portions, orthe tension of the belt substrate becomes loose, causing belt substrate(30A) to be separated from either immersed cathode power-supply section52 or auxiliary cathode power-supply section 54, and thus power supplyis blocked, the other auxiliary cathode power-supply section 54 orimmersed cathode power-supply section 52 stays in contact with theplating surface of belt substrate (30A) to supply power. Therefore,electrical potential will not differ among immersed cathode power-supplysection 52, auxiliary cathode power-supply section 54 and belt substrate(30A), and thus electrolytic plating films will not be extracted ontothe surfaces of immersed cathode power-supply section 52 and auxiliarycathode power-supply section 54. Accordingly, defect-causing troublesuch as plated films that are peeled from immersed cathode power-supplysection 52 and auxiliary cathode power-supply section 54 and aretransferred onto belt substrate (30A) will not occur, and the quality offilled vias may be improved. In addition, the need for maintenance onimmersed cathode power-supply section 52 and auxiliary cathodepower-supply section 54 arranged in the plating tank may be practicallyeliminated.

Also, according to the plating apparatus of Example 1, since immersedcathode power-supply roller 52 and auxiliary cathode power-supply roller54 are arranged on the non-plating surface side, and thus the substrateblocks electric current, plating is seldom extracted onto the powersupply rollers. In Example 1, a roller positioned on the plating surfaceside is formed as insulative roller 56. However, if anodes 14 are movedaway to where plating is substantially not extracted, a metal rollerinstead of an insulative roller may be used.

Also, since immersed cathode power-supply section 52 is immersed inplating tank 12 (in the plating solution) to supply power, plating maybe performed without pulling the substrate out of the solution until theplating is completed. Accordingly, the degree of concavity at filledvias may be made 10 μm or less, and the difference of the degree ofconcavity at each filled via may be made 7 μm or less.

In the following, manufacturing a printed wiring board using the platingapparatus of Example 1 is described with reference to FIGS. 3 and 4.Laminated belt substrate (30A) was prepared as a starting material,where on the surface of 25 μm-thick polyimide belt substrate 30, 9μm-thick copper foil 33 is laminated, and on the back surface, 12μm-thick copper foil 34 is laminated (FIG. 3(A)). First, by lightetching, the thickness of 9 μm-thick copper foil 33 was adjusted to 7 μm(FIG. 3(B)). Next, using a laser, openings 36, which penetrate copperfoil 33 and polyimide belt substrate 30 and reach the back surface ofcopper foil 34, were bored (FIG. 3(C)). Then, on the surface of beltsubstrate (30A), by applying a palladium catalyst, catalytic nuclei wereadhered (not shown in the drawing). Here, when processing with a laser,it is preferred to conduct a publicly-known black oxide treatment.

Next, in an electroless plating solution (Thrucup PEA) made by C.Uyemura & Co., Ltd., the substrate with adhered catalyst was immersedand on the plating surface of belt substrate (30A), 1.0 μm-thickelectroless copper-plated film 38 was formed (FIG. 4(A)).

Then, belt substrate (30A) was washed with 50° C. water to removegrease, washed with 25° C. water, and further washed with sulfuric acid.After that, using plating apparatus 10 described above with reference toFIG. 1, electrolytic plating was performed under the followingconditions to form electrolytic plated film 40 (FIG. 4(B)).

[electrolytic plating solution] sulfuric acid 2.24 mol/l copper sulfate0.26 mol/l additive 19.5 ml/l leveling agent 50 mg/l polishing agent 50mg/l [electrolytic plating conditions] current density 1 A/dm² time 65minutes temperature 22 ± 2° C.

In Example 1, electrolytic plated film 40 was formed to make filled vias44 in openings 36 with the degree of concavity in the range of 5-10 μmand the difference of the degree of concavity in each filled via within5 μm (see FIG. 4(C) for the degree of concavity).

Then, a resist with a predetermined pattern was formed, and etched toform conductive circuit 46 and conductive circuit 42 (FIG. 4(C)).

Example 2

In the following, the structure of a plating apparatus according toExample 2 of the present invention is described with reference to FIG.2. According to the plating apparatus in Example 2, a plating tank isstructured with main tank (12M) and auxiliary tanks (12A). Main tank(12M) and auxiliary tanks (12A) are connected with slits (12 s) wideenough for belt substrate (30A) to pass through. In main tank (12M),anodes 14 are arranged, and in auxiliary tanks (12A), immersed powersupply auxiliary drivers (50A) are arranged.

According to the plating apparatus in Example 2, anodes 14 and cathodepower-supply rollers (52, 54) are each arranged separately in main tank(12M) and auxiliary tanks (12A), and main tank (12M) and auxiliary tanks(12A) are connected only with narrow slits (12 s). Thus, on cathodepower-supply rollers (52, 54), plating is seldom extracted. Even withsuch a tank structure, since main tank (12M) and auxiliary tanks (12A)are connected with slit (12 s), belt substrate is kept immersed in theplating solution until the plating is finished. Therefore, the degree ofconcavity of filled vias may be made 10 μm or less, and the dispersionof the degree of concavity among filled vias may be made 7 μm or less.In Example 2, using the plating apparatus shown in FIG. 2, the beltsubstrate was plated. The degree of concavity of filled vias and thedifference of the degree of concavity among filled vias were the same asin Example 1.

Example 3

In the following, manufacturing steps according to Example 3 aredescribed with reference to FIGS. 5 and 6. In Example 1 described abovewith reference to FIG. 1, using plating apparatus 10, filled vias 44were formed on one surface. In contrast, in Example 3, both surfaces oflaminated belt substrate 130 are plated to form through-holes.

FIG. 5 shows the structure of a plating apparatus according to Example3. In Example 3, compared with the plating apparatus in Example 2described above with reference to FIG. 2, anodes 14 are arranged overboth surfaces of belt substrate (30A).

(1) First, in laminated substrate 130 which is formed by laminating corebelt substrates (30A, 30B, 30C) each having conductive circuit 34,through-hole openings (136 a) are bored (FIG. 6(A)).

(2) Next, electroless plated film 38 is formed on the entire laminatedsubstrate 130 and the interiors of through-hole openings (136 a) (FIG.6(B)).

(3) Using the plating apparatus 10 of Example 2 described above withreference to FIG. 5, on the surfaces of laminated substrate 130,electrolytic plated film 40 is formed and the interiors of through-holeopenings (136 a) are filled with electrolytic plated film 40 (FIG.6(C)).

(4) After forming etching resist, at the portions where the etchingresist is not formed, electrolytic plated film 40 and electroless platedfilm 38 are removed by etching. Then, the etching resist is dissolvedand removed to form independent upper-layer conductive circuit 46(including through-holes 136). (FIG. 6(D)).

Example 4

In Example 4, a plating resist is formed to form a plated layer. Themanufacturing steps are described with reference to FIG. 7

In a laminated substrate formed by laminating copper foil 34 on the backsurface of polyimide belt substrate 30, openings 36, which penetratepolyimide belt substrate 30 and reach the back surface of copper foil34, are bored by a laser (FIG. 7(A)). Then, on the surface of beltsubstrate (30A), electroless copper-plated film 38 is formed (FIG.7(B)). After that, resist layer 39 having a predetermined pattern isformed (FIG. 7(C)). Using plating apparatus 10 described above withreference to FIG. 1, electrolytic plating is performed to formelectrolytic plated-film 40 (FIG. 7(D)). Lastly, by peeling resist layer39 and removing electroless copper-plated film 38 underneath resistlayer 39, filled-vias 44 are formed (FIG. 7(E)).

Example 5

Using the plating apparatus of Example 1, by changing the platingconditions such as current density, filled vias 44, where the degree ofconcavity is in the range of 0-5 μm and the difference of the degree ofconcavity among filled vias is 5 μM, are formed in openings 36.

Example 6

Using the plating apparatus of Example 2, by changing the platingconditions such as current density, filled vias 44, where the degree ofconcavity is in the range of 0-5 μm and the difference of the degree ofconcavity among filled vias is 5 μm, are formed in openings 36.

Comparative Example 1

In Comparative Example 1, same as in the conventional art (JapaneseLaid-Open Patent Application 2000-239892), plating was performed bypositioning all the power-supply rollers outside the solution. Thus,during the plating process, the substrate was pulled out of the platingsolution. The degree of concavity was in the range of 0-25 μm and thedifference of the degree of concavity among filled vias was 25 μm,

Example 7

In Example 7, a multilayered printed wiring board was manufactured. Themanufacturing method is described with reference to FIG. 8. On filledvias 44 in the substrate of Example 1 (FIG. 4(C): lower-layersubstrate), 25 μm-thick epoxy film 130 was laminated, and on conductivecircuit 42 formed with copper film 34, aluminum foil 43 to short-circuiteach conductive circuit was laminated (FIG. 8(A)). After that, directlyon filled vias 44, via holes 36 were formed by a laser (FIG. 8(B)).Then, under the same condition as in Example 1, on the epoxy film andinside the via holes, electroless plated film 38 and electrolytic platedfilm 40 are formed (FIG. 8(C)). By removing aluminum foil 43 andpatterning the plated film on epoxy film 130, via holes 44 andconductive circuit 46 were formed to obtain a multilayered printedwiring board (FIG. 8(D)).

Example 8

In Example 8, using the plating apparatus and belt substrate of Example2, a multilayered printed wiring board was formed as in Example 7.

Example 9

In Example 9, using the plating apparatus and belt substrate of Example5, a multilayered printed wiring board was formed as in Example 7.

Example 10

In Example 10, using the plating apparatus and belt substrate of Example6, a multilayered printed wiring board is formed as in Example 7.

Comparative Example 2

In Comparative Example 2, the substrate used in Example 1 is switched tothe one in Comparative Example 1 (conventional art), a multilayeredprinted wiring board was formed as in Example 6. Here, when formingconductive circuits in Examples 6, 7, 8 and 9 and Comparative Example 2,circuits are formed so as to connect 100 via holes.

[Evaluation Test]

Resistance values of the wirings connecting 100 via holes formed in themultilayered printed wiring boards in Examples 6, 7, 8 and 9, andComparative Example 2 were measured and set as initial values. Then, aheat cycle (−55° C.×5 minutes

125° C.×5 minutes) was repeated 1,000 times. After finishing 1,000cycles, the resistance values were measured again. Then, if the ratio ofthe change in resistance values ((wiring resistance value after 1,000cycles−initial wiring resistance value)/initial wiring resistancevalue×100) is within ±10%, it is considered as passed. The results areshown in FIG. 9.

In the above examples, a plating apparatus used to manufacture via-holesand through-holes is described. However, the plating apparatus accordingto the examples of the present invention may be suitably applied formanufacturing various sections of a printed wiring board. Also, in theabove examples, electrolytic plating is described. However, thestructure of the plating apparatus of the present invention may beapplied for performing electroless plating.

Obviously, numerous modifications and variations of the presentinvention are possible in light of the above teachings. It is thereforeto be understood that within the scope of the appended claims, theinvention may be practiced otherwise than as specifically describedherein.

What is claimed is:
 1. A method for plating a belt substrate,comprising: moving a belt substrate by a conveyor device such that thebelt substrate moves through a plating tank; conveying the beltsubstrate in an interior of the plating tank by an auxiliary devicepositioned in the interior of the plating tank such that the beltsubstrate makes contact with the auxiliary device and becomes a cathode;and electrically plating a surface of the belt substrate in the interiorportion of the plating tank while the auxiliary device maintains cathodepower-supply to the belt substrate conveyed into the interior portion ofthe plating tank, wherein the auxiliary device includes an immersedcathode power-supply roller, an auxiliary cathode power-supply rollerand a short circuit wiring device electrically connecting the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller such that at least one of the immersed cathode power-supplyroller and the auxiliary cathode power-supply roller maintains thecathode power-supply to a plating surface of the belt substrate, theimmersed cathode power-supply roller and the auxiliary cathodepower-supply roller of the auxiliary device are positioned on anon-plating surface side inside the plating tank, one of the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller is a drive roller configured to convey the belt substrate, andthe other one of the immersed cathode power-supply roller and theauxiliary cathode power-supply roller is a dependent roller configuredto rotate according to the drive roller.
 2. A method for plating a beltsubstrate according to claim 1, wherein the belt substrate is conveyedby the conveyor device through the interior portion of the plating tankwhile being conveyed by the auxiliary device comprising the immersedcathode power-supply roller, the auxiliary cathode power-supply roller,and an insulative roller positioned on a plating surface side of thebelt substrate.
 3. A method for plating a belt substrate according toclaim 1, wherein the immersed cathode power-supply roller and theauxiliary cathode power-supply roller are positioned such that at leastone of the immersed cathode power-supply roller and the auxiliarycathode power-supply roller maintains tension of the belt substratecarried by the conveyor device configured to carry the belt substratethrough the interior portion of the plating tank.
 4. A method forplating a belt substrate according to claim 1, wherein the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller are positioned side by side on the non-plating surface side ofthe belt substrate inside the plating tank.
 5. A method for plating abelt substrate according to claim 1, wherein the immersed cathodepower-supply roller and the auxiliary cathode power-supply roller arepositioned offset from a plurality of anodes such that the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller do not face the anodes provided within the interior portion ofthe plating tank.
 6. A method for plating a belt substrate according toclaim 1, wherein the plating tank comprises a main tank, a plurality ofanodes positioned in the main tank, and an auxiliary tank communicatedwith the main tank through a slit configured to pass the belt substrate,and the immersed cathode power-supply device roller and the auxiliarycathode power-supply roller are positioned in the auxiliary tank.
 7. Amethod for plating a belt substrate according to claim 1, wherein theauxiliary device includes an insulative roller, the immersed cathodepower-supply roller comprises a conductive roller, and the auxiliarycathode power-supply roller comprises a conductive roller.
 8. A methodfor plating a belt substrate according to claim 1, wherein the auxiliarydevice includes an insulative roller positioned relative to the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller positioned side by side.
 9. A method for plating a belt substrateaccording to claim 1, wherein the immersed cathode power-supply rollercomprises a conductive roller, the auxiliary cathode power-supply rollercomprises a conductive roller, and the immersed cathode power-supplydevice and the auxiliary cathode power-supply device are positioned sideby side relative to an insulative roller such that at least one of theimmersed cathode power-supply roller and the auxiliary cathodepower-supply roller maintains tension of the belt substrate carried bythe conveyor device configured to carry the belt substrate through theinterior portion of the plating tank.
 10. A method for plating a beltsubstrate according to claim 1, wherein the auxiliary device comprisingthe immersed cathode power-supply roller and the auxiliary cathodepower-supply roller is positioned in the interior of the plating tanksuch that the immersed cathode power-supply roller and the auxiliarycathode power-supply roller are immersed in a plating solution in theplating tank.
 11. A method for plating a belt substrate according toclaim 1, wherein the immersed cathode power-supply roller and theauxiliary cathode power-supply roller are positioned side by side suchthat at least one of the immersed cathode power-supply roller and theauxiliary cathode power-supply roller maintains tension of the beltsubstrate carried by the conveyor device.
 12. A method for plating abelt substrate according to claim 1, wherein the conveying of the beltsubstrate comprises conveying the belt substrate by the auxiliary deviceprovided in a plurality in the interior of the plating tank such thatthe plurality of auxiliary devices include a first auxiliary devicepositioned at one end of the interior of the plating tank and a secondauxiliary device positioned at the opposite end of the interior of theplating tank.
 13. A method for plating a belt substrate according toclaim 1, wherein the conveying of the belt substrate comprises conveyingthe belt substrate by the auxiliary device provided in a plurality inthe interior of the plating tank such that the plurality of auxiliarydevices include a first auxiliary device positioned at one end of theinterior of the plating tank and a second auxiliary device positioned atthe opposite end of the interior of the plating tank, and the platingtank has a plurality of anodes positioned between the first auxiliarydevice and the second auxiliary device along a conveying direction ofthe belt substrate.
 14. A method for plating a belt substrate accordingto claim 13, wherein each of the first and second the auxiliary devicesincludes an insulative roller positioned relative to the immersedcathode power-supply roller and the auxiliary cathode power-supplyroller positioned side by side.
 15. A method for plating a beltsubstrate according to claim 1, wherein the auxiliary device includes aninsulative roller positioned on a plating surface side of the beltsubstrate relative to the immersed cathode power-supply roller and theauxiliary cathode power-supply roller positioned side by side in theinterior of the plating tank such that the insulative roller, theimmersed cathode power-supply roller and the auxiliary cathodepower-supply roller are immersed in a plating solution in the platingtank.